Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Revision history

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curprev 13:2213:22, 10 August 2023‎ Bghe talk contribs‎ 7,719 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 13:2113:21, 10 August 2023‎ Bghe talk contribs‎ 7,719 bytes +24‎ →‎SiO2 etch using DUV mask
curprev 13:2113:21, 10 August 2023‎ Bghe talk contribs‎ 7,695 bytes −3‎ →‎SiO2 etch using DUV mask

curprev 17:0617:06, 6 February 2023‎ Bghe talk contribs‎ 7,698 bytes +5‎ No edit summary
curprev 17:0617:06, 6 February 2023‎ Bghe talk contribs‎ 7,693 bytes +14‎ No edit summary
curprev 17:0517:05, 6 February 2023‎ Bghe talk contribs‎ 7,679 bytes +5‎ →‎SiO2 etching in the ICP metal

curprev 13:3113:31, 6 September 2022‎ Bghe talk contribs‎ 7,674 bytes +31‎ No edit summary

curprev 21:3721:37, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch with e-beam resist
curprev 20:2020:20, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 20:1820:18, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 20:1820:18, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes +5‎ No edit summary

curprev 17:0417:04, 18 January 2019‎ Bghe talk contribs‎ 7,638 bytes +161‎ →‎Slow etch of SiO2 with resist as masking material - using a 6" carrier wafer with recess

curprev 09:3909:39, 23 January 2017‎ Bghe talk contribs‎ 7,477 bytes −2‎ →‎SiO2 etch using DUV mask

curprev 11:4411:44, 20 January 2017‎ Bghe talk contribs‎ 7,479 bytes +43‎ →‎SiO2 etch using DUV mask

curprev 08:4408:44, 20 December 2016‎ Bghe talk contribs‎ 6,011 bytes +54‎ →‎SiO2 etch using DUV mask
curprev 08:4308:43, 20 December 2016‎ Bghe talk contribs‎ 5,957 bytes +78‎ →‎SiO2 etch using DUV mask

curprev 14:0514:05, 10 May 2016‎ Bghe talk contribs‎ 5,879 bytes −47‎ →‎SiO2 etch using DUV mask 70px
curprev 14:0514:05, 10 May 2016‎ Bghe talk contribs‎ 5,926 bytes −60‎ →‎SiO2 etch using DUV mask 70px
curprev 13:5513:55, 10 May 2016‎ Bghe talk contribs‎ 5,986 bytes −46‎ →‎SiO2 etch with e-beam resist 70px

curprev 11:1911:19, 3 May 2016‎ Bghe talk contribs‎ 6,032 bytes +2‎ →‎SiO2 etch using DUV mask 70px
curprev 11:1911:19, 3 May 2016‎ Bghe talk contribs‎ 6,030 bytes +33‎ →‎SiO2 etch using DUV mask 70px

curprev 12:4412:44, 2 May 2016‎ Bghe talk contribs‎ 5,622 bytes +81‎ →‎SiO2 etch with e-beam resist 70px

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