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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Revision history

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curprev 12:2212:22, 10 August 2023‎ Bghe talk contribs‎ 7,719 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 12:2112:21, 10 August 2023‎ Bghe talk contribs‎ 7,719 bytes +24‎ →‎SiO2 etch using DUV mask
curprev 12:2112:21, 10 August 2023‎ Bghe talk contribs‎ 7,695 bytes −3‎ →‎SiO2 etch using DUV mask

curprev 16:0616:06, 6 February 2023‎ Bghe talk contribs‎ 7,698 bytes +5‎ No edit summary
curprev 16:0616:06, 6 February 2023‎ Bghe talk contribs‎ 7,693 bytes +14‎ No edit summary
curprev 16:0516:05, 6 February 2023‎ Bghe talk contribs‎ 7,679 bytes +5‎ →‎SiO2 etching in the ICP metal

curprev 12:3112:31, 6 September 2022‎ Bghe talk contribs‎ 7,674 bytes +31‎ No edit summary

curprev 20:3720:37, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch with e-beam resist
curprev 19:2019:20, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 19:1819:18, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes 0‎ →‎SiO2 etch using DUV mask
curprev 19:1819:18, 25 November 2019‎ Jmli talk contribs‎ 7,643 bytes +5‎ No edit summary

curprev 16:0416:04, 18 January 2019‎ Bghe talk contribs‎ 7,638 bytes +161‎ →‎Slow etch of SiO2 with resist as masking material - using a 6" carrier wafer with recess

curprev 08:3908:39, 23 January 2017‎ Bghe talk contribs‎ 7,477 bytes −2‎ →‎SiO2 etch using DUV mask

curprev 10:4410:44, 20 January 2017‎ Bghe talk contribs‎ 7,479 bytes +43‎ →‎SiO2 etch using DUV mask

curprev 07:4407:44, 20 December 2016‎ Bghe talk contribs‎ 6,011 bytes +54‎ →‎SiO2 etch using DUV mask
curprev 07:4307:43, 20 December 2016‎ Bghe talk contribs‎ 5,957 bytes +78‎ →‎SiO2 etch using DUV mask

curprev 13:0513:05, 10 May 2016‎ Bghe talk contribs‎ 5,879 bytes −47‎ →‎SiO2 etch using DUV mask 70px
curprev 13:0513:05, 10 May 2016‎ Bghe talk contribs‎ 5,926 bytes −60‎ →‎SiO2 etch using DUV mask 70px
curprev 12:5512:55, 10 May 2016‎ Bghe talk contribs‎ 5,986 bytes −46‎ →‎SiO2 etch with e-beam resist 70px

curprev 10:1910:19, 3 May 2016‎ Bghe talk contribs‎ 6,032 bytes +2‎ →‎SiO2 etch using DUV mask 70px
curprev 10:1910:19, 3 May 2016‎ Bghe talk contribs‎ 6,030 bytes +33‎ →‎SiO2 etch using DUV mask 70px

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