Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/Etch slow: Revision history

6 February 2023

• curprev 14:4414:44, 6 February 2023‎ Bghe talk contribs‎ 1,590 bytes +17‎ No edit summary

18 August 2021

• curprev 13:5613:56, 18 August 2021‎ Bghe talk contribs‎ 1,573 bytes 0‎ No edit summary

28 January 2019

• curprev 09:1109:11, 28 January 2019‎ Bghe talk contribs‎ 1,573 bytes +17‎ →‎Etch slow (this was tested in 2012)

11 January 2016

• curprev 08:3108:31, 11 January 2016‎ Bghe talk contribs‎ 1,556 bytes +26‎ →‎Etch slow

11 October 2013

• curprev 08:3708:37, 11 October 2013‎ Bghe talk contribs‎ 1,530 bytes +226‎ No edit summary

27 August 2013

• curprev 09:4409:44, 27 August 2013‎ Bghe talk contribs‎ 1,304 bytes +118‎ →‎Etch slow

1 August 2012

• curprev 10:5010:50, 1 August 2012‎ BGE talk contribs‎ 1,186 bytes +114‎ →‎Etch slow

31 July 2012

• curprev 10:1710:17, 31 July 2012‎ BGE talk contribs‎ 1,072 bytes +26‎ →‎Etch slow
• curprev 09:5309:53, 31 July 2012‎ BGE talk contribs‎ 1,046 bytes +11‎ →‎Etch slow
• curprev 09:5209:52, 31 July 2012‎ BGE talk contribs‎ 1,035 bytes +84‎ →‎Etch slow
• curprev 09:4809:48, 31 July 2012‎ BGE talk contribs‎ 951 bytes +12‎ →‎Etch slow
• curprev 09:4709:47, 31 July 2012‎ BGE talk contribs‎ 939 bytes +626‎ →‎Etch slow
• curprev 09:3609:36, 31 July 2012‎ BGE talk contribs‎ 313 bytes +313‎ New page: =Etch slow= This process development is going on to find an etch recipe that is so gentle that the resist masking material can be removed with acetone + ultrasound within hopefully 10min....