Specific Process Knowledge/Etch/Etching of TOPAS: Revision history

9 August 2022

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25 November 2019

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13 August 2019

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14 June 2017

• curprev 12:2012:20, 14 June 2017‎ Bghe talk contribs‎ 2,107 bytes +24‎ →‎Etching of TOPAS

3 February 2016

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25 November 2013

• curprev 10:1010:10, 25 November 2013‎ Khara talk contribs‎ 2,032 bytes −46‎ →‎Etching of TOPAS 70px

5 November 2013

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4 November 2013

• curprev 11:3011:30, 4 November 2013‎ Khara talk contribs‎ m 2,032 bytes 0‎ Khara moved page Etching of TOPAS to Specific Process Knowledge/Etch/Etching of TOPAS: That is the right place
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• curprev 09:5609:56, 4 November 2013‎ Khara talk contribs‎ 812 bytes +102‎ →‎Etching of TOPAS
• curprev 09:5309:53, 4 November 2013‎ Khara talk contribs‎ 710 bytes +1‎ No edit summary
• curprev 09:5309:53, 4 November 2013‎ Khara talk contribs‎ 709 bytes +709‎ Created page with "==Etching of TOPAS== TOPAS is etched by an oxygen plasma in the ASE. Masking of TOPAS was achieved by photo resist or a hard mask of aluminum or silicon. Photo resist is the p..."