Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE: Revision history

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curprev 17:3817:38, 1 February 2023‎ Bghe talk contribs‎ 11,426 bytes −75‎ No edit summary

curprev 15:1515:15, 31 January 2023‎ Bghe talk contribs‎ 11,501 bytes +34‎ →‎QC on the AOE
curprev 15:1415:14, 31 January 2023‎ Bghe talk contribs‎ 11,467 bytes +89‎ No edit summary

curprev 15:2015:20, 29 August 2022‎ Bghe talk contribs‎ 11,378 bytes +15‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?
curprev 15:1915:19, 29 August 2022‎ Bghe talk contribs‎ 11,363 bytes +132‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?
curprev 15:1715:17, 29 August 2022‎ Bghe talk contribs‎ 11,231 bytes +29‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 10:5510:55, 19 March 2020‎ Bghe talk contribs‎ 11,202 bytes +8‎ →‎QC on the AOE

curprev 16:5516:55, 16 March 2020‎ Bghe talk contribs‎ 11,194 bytes −11‎ →‎QC on the AOE

curprev 10:4010:40, 13 March 2020‎ Bghe talk contribs‎ 11,205 bytes −26‎ No edit summary
curprev 10:3310:33, 13 March 2020‎ Bghe talk contribs‎ 11,231 bytes +27‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 15:2815:28, 21 February 2020‎ Pevo talk contribs‎ 11,204 bytes +14‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 16:2416:24, 25 November 2019‎ Jmli talk contribs‎ 11,190 bytes 0‎ No edit summary
curprev 16:2216:22, 25 November 2019‎ Jmli talk contribs‎ 11,190 bytes −20‎ No edit summary

curprev 11:0511:05, 28 January 2019‎ Bghe talk contribs‎ 11,210 bytes −4‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?
curprev 11:0411:04, 28 January 2019‎ Bghe talk contribs‎ 11,214 bytes 0‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 14:4214:42, 13 January 2017‎ Bghe talk contribs‎ 11,214 bytes +124‎ →‎Etching SiO2 with hard mask (metal or dielectrics)
curprev 14:3814:38, 13 January 2017‎ Bghe talk contribs‎ 11,090 bytes +360‎ No edit summary

curprev 10:5810:58, 29 February 2016‎ Bghe talk contribs‎ 10,730 bytes +38‎ No edit summary
curprev 10:5310:53, 29 February 2016‎ Bghe talk contribs‎ 10,692 bytes +72‎ No edit summary
curprev 10:4610:46, 29 February 2016‎ Bghe talk contribs‎ 10,620 bytes 0‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?
curprev 10:4410:44, 29 February 2016‎ Bghe talk contribs‎ 10,620 bytes +216‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 11:3411:34, 25 November 2015‎ Bghe talk contribs‎ 10,404 bytes +140‎ →‎What masking material should I choose when etching SiO2/glass in the AOE?

curprev 13:0313:03, 19 November 2015‎ Bghe talk contribs‎ 19,806 bytes −2,060‎ →‎Slow etch of SiO2 with resist as masking material - to be used with 150mm Si carrier wafer

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