Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/EM with resist mask: Revision history

11 September 2023

• curprev 11:4811:48, 11 September 2023‎ Bghe talk contribs‎ 493 bytes +184‎ No edit summary
• curprev 08:3608:36, 11 September 2023‎ Bghe talk contribs‎ 309 bytes +11‎ →‎Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist
• curprev 08:3508:35, 11 September 2023‎ Bghe talk contribs‎ 298 bytes +137‎ →‎Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist
• curprev 08:2808:28, 11 September 2023‎ Bghe talk contribs‎ 161 bytes +59‎ →‎Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist
• curprev 08:2708:27, 11 September 2023‎ Bghe talk contribs‎ 102 bytes +8‎ →‎Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist
• curprev 08:2608:26, 11 September 2023‎ Bghe talk contribs‎ 94 bytes +94‎ Created page with "==Looking at bit on the effect of using electromagnets for etching SiO2 with DUV resist== {{}}"