File:WF 2E05 mar23 2011-120c.jpg: Revision history

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7 April 2011

  • curprev 14:2214:22, 7 April 2011‎ Jml talk contribs‎ 198 bytes +198‎ Etching of nanostructures in Si using the ICP metal etcher: Sinano3.32 recipe, Run ID 465, 466 and 467, time 60, 120 and 180 secs, BCl3 5, HBr 15, 2mtorr, 900/30 coil/platen, 50 degs. 100 mm spacers
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