File:WF 2E03 mar23 2011-090a.jpg: Revision history

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4 April 2011

  • curprev 12:4112:41, 4 April 2011‎ Jml talk contribs‎ 196 bytes +196‎ Etching of nanostructures in Si using the ICP metal etcher: Sinano3.31 recipe, Run ID 452(abc), 453(bc) and 454 (c), time 60, 120 and 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 50 degs.
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