File:WF 2C5 feb2011 030.jpg: Revision history

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24 March 2011

  • curprev 15:1815:18, 24 March 2011‎ Jml talk contribs‎ 150 bytes +150‎ Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1817, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, -10 degs.
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