File:WF 2C3feb2011-150.jpg: Revision history

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24 March 2011

  • curprev 15:1515:15, 24 March 2011Jml talk contribs 149 bytes +149 Etching of nanostructures in Si using DRIE-Pegasus: nano1.0 recipe, Run ID 1801, time 120 secs, SF6 38, C4F8 52, 4mtorr, 800/50 coil/platen, 10 degs.