File:WF 2B5 feb06 2011-120.jpg: Revision history

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15 March 2011

  • curprev 14:4914:49, 15 March 2011‎ Jml talk contribs‎ 157 bytes +157‎ Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.
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