File:WF 2B1 feb06 2011-030.jpg: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

16 March 2011

  • curprev 08:5208:52, 16 March 2011‎ Jml talk contribs‎ 212 bytes +212‎ The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=File:WF_2B1_feb06_2011-030.jpg"