File:WF 2A-5 feb06 2011-150.jpg: Revision history

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7 March 2011

  • curprev 14:3914:39, 7 March 2011‎ Jml talk contribs‎ 156 bytes +156‎ Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.
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