File:RIE1 150nitride bgenitr 3.5min.tif: Revision history

21 September 2009

• curprev 10:3510:35, 21 September 2009‎ Pvl talk contribs‎ 215 bytes 0‎ uploaded a new version of "Image:RIE1 150nitride bgenitr 3.5min.tif": RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been
• curprev 10:2410:24, 21 September 2009‎ Pvl talk contribs‎ 215 bytes 0‎ uploaded a new version of "Image:RIE1 150nitride bgenitr 3.5min.tif": RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been
• curprev 10:1710:17, 21 September 2009‎ Pvl talk contribs‎ 215 bytes 0‎ uploaded a new version of "Image:RIE1 150nitride bgenitr 3.5min.tif": RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been

7 September 2009

• curprev 15:0315:03, 7 September 2009‎ Pvl talk contribs‎ 215 bytes +215‎ RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.