File:Bc 5 7 jpeg.jpg: Revision history

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21 September 2009

  • curprev 10:3710:37, 21 September 2009‎ Pvl talk contribs‎ 215 bytes +215‎ RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.
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