File:BGE Glass etch Cr50Au400n1 04.jpg: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

3 December 2010

  • curprev 09:0909:09, 3 December 2010‎ BGE talk contribs‎ 231 bytes +231‎ 15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=File:BGE_Glass_etch_Cr50Au400n1_04.jpg"