File:BGE Glass etch Cr50Au400n1 01.jpg: Revision history

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3 December 2010

  • curprev 09:0709:07, 3 December 2010‎ BGE talk contribs‎ 231 bytes +231‎ 15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.
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