Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch: Revision history

Jump to navigation Jump to search

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

(newest | oldest) View ( | older 50) (20 | 50 | 100 | 250 | 500)

23 April 2021

5 February 2021

  • curprev 09:2909:29, 5 February 2021Bghe talk contribs 796 bytes +796 Created page with "<gallery caption="Recipe no. 10: C06445_02 coil_2500W, platen:300W, He/C4F8= 17.5, C4F8/H2=1, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:25.6sccm, 3:56 min " perrow="8..."
(newest | oldest) View ( | older 50) (20 | 50 | 100 | 250 | 500)