Specific Process Knowledge/Etch/Etching of Silicon Nitride: Revision history

22 April 2013

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11 April 2013

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10 April 2013

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18 July 2011

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31 January 2008

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19 November 2007

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15 November 2007

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1 November 2007

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30 October 2007

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29 October 2007

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17 October 2007

• curprev 12:0912:09, 17 October 2007‎ BGE talk contribs‎ 362 bytes +362‎ New page: Silicon nitride can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (backside and frontside) of a wafer. D...