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Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Revision history

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curprev 17:1417:14, 11 November 2019‎ Bghe talk contribs‎ 7,054 bytes +739‎ No edit summary

curprev 10:2210:22, 19 February 2019‎ Bghe talk contribs‎ 4,599 bytes 0‎ →‎Changing the Cl2/N2 ratio

curprev 15:3915:39, 24 August 2018‎ Bghe talk contribs‎ 4,599 bytes +102‎ →‎InP etch with Cl2/CH4/Ar 2013
curprev 13:2313:23, 24 August 2018‎ Bghe talk contribs‎ 4,497 bytes +76‎ No edit summary
curprev 12:5212:52, 24 August 2018‎ Bghe talk contribs‎ 4,421 bytes +5‎ →‎InP/InGaAsP/InGaAs etch

curprev 08:5408:54, 2 July 2018‎ Bghe talk contribs‎ 4,416 bytes +91‎ →‎Changing the Cl2/N2 ratio
curprev 08:5208:52, 2 July 2018‎ Bghe talk contribs‎ 4,325 bytes 0‎ →‎Changing the Cl2/N2 ratio
curprev 08:5108:51, 2 July 2018‎ Bghe talk contribs‎ 4,325 bytes +44‎ →‎Changing the Cl2/N2 ratio

curprev 11:5711:57, 20 June 2018‎ Bghe talk contribs‎ 2,959 bytes +82‎ →‎Sample pattern before etching
curprev 11:5711:57, 20 June 2018‎ Bghe talk contribs‎ 2,877 bytes −2‎ →‎Etching of an InP piece on Si carrier
curprev 11:5511:55, 20 June 2018‎ Bghe talk contribs‎ 2,879 bytes +180‎ →‎InP etching June 2018

curprev 11:4111:41, 1 August 2016‎ Jmli talk contribs‎ 1,133 bytes +1‎ No edit summary

curprev 14:2414:24, 19 June 2014‎ Bghe talk contribs‎ 1,132 bytes +1,132‎ Created page with "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etc..."

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