Specific Process Knowledge/Etch/Etching of Silicon Oxide: Revision history

22 January 2014

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10 September 2013

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13 May 2013

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8 May 2013

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22 April 2013

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11 April 2013

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10 April 2013

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29 May 2012

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20 January 2012

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18 July 2011

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10 September 2008

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31 January 2008

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15 January 2008

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19 November 2007

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13 November 2007

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1 November 2007

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• curprev 09:3009:30, 1 November 2007‎ BGE talk contribs‎ 1,333 bytes +1,333‎ New page: Silicon oxide can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (backside and front side) of a wafer. Dr...