View source for Specific Process Knowledge/Wafer cleaning/Triton-X soap cleaning

==Triton-X soap cleaning== 
[[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]]
The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a non-ionic detergent which is metal ion-free. This detergent is added to reduce surface tension and thus helps removing particles from the samples to be cleaned.

===Procedure===
The bench in the gowning contains a sink, an ultrasonics bath and a rinse bath for rinsing samples cleaned in Triton X-100. To clean the samples: 

*Find a suitable holder for your samples in the cupboard below the baths
*Make sure the ultrasonics bath dump valve is closed
*Fill the ultrasonics bath (the one made of metal) with DI water until your samples are completely covered
*Add 20 - 30 drops of diluted Triton X-100 detergent from the rinse/spray bottle. Do '''''NOT''''' use undiluted Triton X-100
*Close the bath lid to minimize noise from the ultrasonics bath
*Start the ultrasound on the front panel
*Leave the samples in ultrasonics for 10 min
*Switch off ultrasound
*Fill the rinse bath (the one made in plastic) with DI water and rinse your samples thoroughly
*Remove and dry your samples
*Dump the Triton X-100 solution and rinse bath. Rinse both tanks with DI water. Leave dump valves open so the baths drain completely
*Continue with [http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha Piranha] cleaning.