View source for Specific Process Knowledge/Thermal Process/Furnace: Multipurpose annealing/Acceptance test

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==Multipurpose Anneal furnace acceptance test==

The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.

At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times

For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.

==Oxidation parameters==

'''Recipe''': "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"

'''Oxidation time''': 80 min

'''Temperature''': 1050 <sup>o</sup>C (all temperature zones)

'''O<sub>2</sub> flow''': 1 slm

The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30. 

Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.

==Results==

====Oxide thickness====

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! 
! Date
! colspan="3" | Wafer 4
! colspan="3" | Wafer 16
! colspan="3" | Wafer 28
! colspan="3" | Center point only
|-
! width="80" |   
! width="80" | 
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation 
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average oxide thickness [nm]
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
|-
! Run 1
| 28-01-2015
| 109.7
| 1.0
| 1.7
| 107.7
| 0.9
| 1.1
| 106.5
| 0.8
| 1.2
| 107.0
| 2.1
| 1.9
|-
! Run 2 
| 28-01-2015
| 107.3
| 1.7
| 2.4
| 105.0
| 1.4
| 1.7
| 107.3
| 0.7
| 0.9
| 105.7
| 1.0
| 0.9
|-
! Run 3
| 30-01-2015
| 103.6
| 0.8
| 1.1
| 102.6
| 0.6
| 1.2
| 102.2
| 0.6
| 1.1
| 102.9
| 1.0
| 1.0
|-
! Average
|
| 106.9
| 1.2
| 1.7
| 105.1
| 1.0
| 1.3
| 105.3
| 0.7
| 1.1
| 105.2
| 1.4
| 1.3
|}


{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! colspan="3" | Run-to-run
|-
! width="90" | Average oxide thickness [nm]
! width="90" | St. deviation 
! width="90" | Non-uniformity [%]
|-
| 105.2
| 2.1
| 2.0
|}


====Refractive index====

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! 
! Date
! colspan="3" | Wafer 4
! colspan="3" | Wafer 16
! colspan="3" | Wafer 28
! colspan="3" | Center point only
|-
! width="80" |   
! width="80" | 
! width="70" | Average refractive index
! width="70" | St. deviation 
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
! width="70" | Average refractive index
! width="70" | St. deviation
! width="70" | Non-uniformity [%]
|-
! Run 1
| 28-01-2015
| 1.46
| 0.00
| 0.04
| 1.46
| 0.00
| 0.07
| 1.46
| 0.00
| 0.06
| 1.4609
| 0.0004
| 0.0230
|-
! Run 2 
| 28-01-2015
| 1.46
| 0.00
| 0.09
| 1.46
| 0.00
| 0.17
| 1.44
| 0.01
| 0.69
| 1.4561
| 0.0094
| 05873
|-
! Run 3
| 30-01-2015
| 1.46
| 0.00
| 0.06
| 1.46
| 0.00
| 0.05
| 1.46
| 0.00
| 0.07
| 1.4602
| 0.0004
| 0.0291
|-
! Average
|
| 1.46
| 0.00
| 0.06
| 1.46
| 0.00
| 0.10
| 1.46
| 0.00
| 0.27
| 1.46
| 0.00
| 0.21
|}


{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|-
! colspan="3" | Run-to-run
|-
! width="90" | Average refractive index
! width="90" | St. deviation 
! width="90" | Non-uniformity [%]
|-
| 1.4591
| 0.0026
| 0.1637
|}