View source for Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/Cr etch data from AS

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= Test data on Cr etch development by Anders Simonsen @nbi.ku=


==Final recipe/result for Cr etch and etching down in the nitride in the AOE==
The SEM images where done some after the Cr etch and some after both the Cr etch and the silicon nitride etch in the AOE using the recipe "SiN_AS". The important thing was to see how well the Cr works for masking the nitride given vertical and smooth sidewalls in the nitride.   

{| class="wikitable"
! Recipe !! Pressure [mTorr] !! Coil power [W] !! Platen power [W] !! Total Flow Cl2+O2 [sccm] !! O2% !! Temp !!  !! Time [s] !! CSAR etch rate [nm/min] !! CSAR rate w bond !!  !! Etch rate [nm/min] !! Selectivity !!  !! coil load !! coil tune !! plat load !! plat tune !! Comment
|-
! test13/laqs
| 10 || 300 || 15 || 30 || 23.33 || 20 ||  || 28 || 100.71 ||  ||  || 42.86 || 0.43 ||  ||  ||  ||  ||  || This recipe was chosen over no. 12 because it did not need a large over etch of the Cr (no foot).
|-
|}

<gallery caption="After Cr etch with recipe 13 with descum" widths="250px" heights="250px" perrow="8">

Image:EBL10_descum6s_Cr40s_0822.jpg
Image:EBL10_descum6s_Cr40s_0823.jpg
Image:EBL10_descum6s_Cr40s_0829.jpg
Image:EBL10_descum6s_Cr40s_0830.jpg
Image:EBL10_descum6s_Cr40s_0831.jpg
Image:EBL10_descum6s_Cr40s_0834.jpg
Image:EBL10_descum6s_Cr40s_0835.jpg
Image:EBL10_descum6s_Cr40s_0836.jpg

</gallery>


<gallery caption="After Cr etch 75s with recipe 13 and nitride etch in the AOE 20s" widths="250px" heights="250px" perrow="8">

Image:Cr-75s_sin-met-20s_0733.jpg
Image:Cr-75s_sin-met-20s_0734.jpg
Image:Cr-75s_sin-met-20s_0735.jpg
Image:Cr-75s_sin-met-20s_0736.jpg
Image:Cr-75s_sin-met-20s_0737.jpg
Image:Cr-75s_sin-met-20s_0738.jpg
Image:Cr-75s_sin-met-20s_0739.jpg
</gallery>

<gallery caption="After Cr etch 75s with recipe 13 and nitride etch in the AOE 40s" widths="250px" heights="250px" perrow="8">

Image:Cr-75s_sin-met-40s_0741.jpg
Image:Cr-75s_sin-met-40s_0742.jpg
Image:Cr-75s_sin-met-40s_0743.jpg
Image:Cr-75s_sin-met-40s_0744.jpg
Image:Cr-75s_sin-met-40s_0745.jpg
Image:Cr-75s_sin-met-40s_0746.jpg
Image:Cr-75s_sin-met-40s_0748.jpg
Image:Cr-75s_sin-met-40s_0749.jpg

</gallery>


<gallery caption="After Cr etch 85s with recipe 13 and nitride etch in the AOE 20s" widths="250px" heights="250px" perrow="8">
Image:Cr-nano-85s_sin-met-20s_0750.jpg
Image:Cr-nano-85s_sin-met-20s_0751.jpg
Image:Cr-nano-85s_sin-met-20s_0752.jpg
Image:Cr-nano-85s_sin-met-20s_0753.jpg
Image:Cr-nano-85s_sin-met-20s_0754.jpg
Image:Cr-nano-85s_sin-met-20s_0755.jpg
Image:Cr-nano-85s_sin-met-20s_0756.jpg

</gallery>

<gallery caption="After Cr etch 90s with recipe 13 and nitride etch in the AOE 20s" widths="250px" heights="250px" perrow="8">

Image:Cr-90s_sin-met-20s_0758.jpg
Image:Cr-90s_sin-met-20s_0759.jpg
Image:Cr-90s_sin-met-20s_0760.jpg
Image:Cr-90s_sin-met-20s_0761.jpg
Image:Cr-90s_sin-met-20s_0762.jpg
Image:Cr-90s_sin-met-20s_0763.jpg
</gallery>

==DOE experiments and results made on pattern free samples and samples patterned with UV lithography (SEM images)==
{| class="wikitable"
! Name !! Pressure [mTorr] !! Coil power [W] !! Platen power [W] !! Total Flow (Cl2+O2) [sccm] !! O2 % !! Selectivity !! Etch-rate [nm/min] !! Side-angle !! Corner !! Resist-damage !! Etch time [s] !! Etch depth [nm] !!  !! Angle1 !! Radius1 !! Angle2
|-
! t5
| 5 || 300 || 25 || 40 || 25 || 0.21 || 49.03 || 25.5 || 319.5 || 1 || 175 || 57 ||  || 28 || 331 || 23
|-
! t7
| 15 || 300 || 15 || 40 || 15 || 0.61 || 52.15 || 12 || 154.5 || 1 || 130 || 87 ||  || 14 || 159 || 10
|-
! t8
| 5 || 500 || 15 || 40 || 25 || 0.4 || 49.50 || 39.5 || 228.5 || 1 || 120 || 101 ||  || 42 || 169 || 37
|-
! t4
| 15 || 500 || 25 || 40 || 15 || 0.39 || 70.80 || 19.5 || 201 || 1 || 100 || 82 ||  || 21 || 158 || 18
|-
! t2
| 5 || 300 || 25 || 80 || 15 || 0.21 || 40.54 || 40.5 || 262.5 || 3 || 185 || 75 ||  || 42 || 274 || 39
|-
! t10
| 15 || 300 || 15 || 80 || 25 || 0.68 || 58.00 || 11.5 || 87 || 2 || 120 || 84 ||  || 14 || 70 || 9
|-
! t6
| 5 || 500 || 15 || 80 || 15 || 0.43 || 49.24 || 29.5 || 300 || 5 || 145 || 81 ||  || 29 || 362 || 30
|-
! t9
| 15 || 500 || 25 || 80 || 25 || 0.41 || 80.67 || 18.5 || 134.5 || 2 || 90 || 79 ||  || 20 || 155 || 17
|-
! t1
| 10 || 400 || 20 || 60 || 20 || 0.35 || 63.13 || 17.5 || 288 || 2 || 115 || 79 ||  || 20 || 292 || 15
|-
! t1R
| 10 || 400 || 20 || 60 || 20 || 0.4 || 57.14 || 20 || 186 || 2 || 105 || 100 ||  || 24 || 232 || 16
|}

===Sem images of the DOE===
<gallery caption="Sample t5" widths="250px" heights="250px" perrow="8">

Image:M7_t5_0626.jpg
Image:M7_t5_0627.jpg
Image:M7_t5_0628.jpg
Image:M7_t5_0629.jpg
Image:M7_t5_0630.jpg
Image:M7_t5_0631.jpg
Image:M7_t5_0632.jpg
Image:M7_t5_0633.jpg

</gallery>

<gallery caption="Sample t7" widths="250px" heights="250px" perrow="8">

Image:M7_t7_008.jpg
Image:M7_t7_009.jpg
Image:M7_t7_010.jpg
Image:M7_t7_011.jpg
Image:M7_t7_012.jpg
Image:M7_t7_013.jpg
Image:M7_t7_014.jpg
Image:M7_t7_015.jpg

</gallery>



<gallery caption="Sample t8" widths="250px" heights="250px" perrow="8">

Image:M7_t8_016.jpg
Image:M7_t8_017.jpg
Image:M7_t8_018.jpg
Image:M7_t8_019.jpg
Image:M7_t8_020.jpg
Image:M7_t8_021.jpg
Image:M7_t8_022.jpg
Image:M7_t8_023.jpg

</gallery>

<gallery caption="Sample t4" widths="250px" heights="250px" perrow="8">

Image:M7_t4_0618.jpg
Image:M7_t4_0619.jpg
Image:M7_t4_0620.jpg
Image:M7_t4_0621.jpg
Image:M7_t4_0622.jpg
Image:M7_t4_0623.jpg
Image:M7_t4_0624.jpg
Image:M7_t4_0625.jpg

</gallery>

<gallery caption="Sample t2" widths="250px" heights="250px" perrow="10">

Image:M7_t2_0609.jpg
Image:M7_t2_0610.jpg
Image:M7_t2_0611.jpg
Image:M7_t2_0612.jpg
Image:M7_t2_0613.jpg
Image:M7_t2_0614.jpg
Image:M7_t2_0615.jpg
Image:M7_t2_0616.jpg

</gallery>

<gallery caption="Sample t10" widths="250px" heights="250px" perrow="8">

Image:M7_t10_041.jpg
Image:M7_t10_042.jpg
Image:M7_t10_043.jpg
Image:M7_t10_044.jpg
Image:M7_t10_045.jpg
Image:M7_t10_046.jpg
Image:M7_t10_047.jpg
Image:M7_t10_048.jpg

</gallery>

<gallery caption="Sample t9" widths="250px" heights="250px" perrow="8">

Image:M7_t9_032.jpg
Image:M7_t9_033.jpg
Image:M7_t9_034.jpg
Image:M7_t9_035.jpg
Image:M7_t9_036.jpg
Image:M7_t9_037.jpg
Image:M7_t9_038.jpg
Image:M7_t9_039.jpg

</gallery>

<gallery caption="Sample t1" widths="250px" heights="250px" perrow="8">

Image:M7_t1_0601.jpg
Image:M7_t1_0602.jpg
Image:M7_t1_0603.jpg
Image:M7_t1_0604.jpg
Image:M7_t1_0605.jpg
Image:M7_t1_0606.jpg
Image:M7_t1_0607.jpg

</gallery>

<gallery caption="Sample t1R" widths="250px" heights="250px" perrow="8">

Image:M7_t1R_024.jpg
Image:M7_t1R_025.jpg
Image:M7_t1R_026.jpg
Image:M7_t1R_027.jpg
Image:M7_t1R_028.jpg
Image:M7_t1R_029.jpg
Image:M7_t1R_030.jpg
Image:M7_t1R_031.jpg

</gallery>

==Tests made after DOE with e-beam patterned samples==

{| class="wikitable"
! Recipe !! Pressure [mTorr] !! Coil power [W] !! Platen power [W] !! Total Flow Cl2+O2 [sccm] !! O2% !! Temp !!  !! Time [s] !! CSAR etch rate [nm/min] !! CSAR rate w bond !!  !! Etch rate [nm/min] !! Selectivity !!  !! coil load !! coil tune !! plat load !! plat tune !! Comment
|-
! test11
| 15 || 300 || 15 || 40 || 25.00 || 20 ||  || 23 || 80.87 || 73 ||  || 52.17 || 0.65 ||  ||  ||  ||  ||  || 
|-
! test12
| 20 || 300 || 15 || 30 || 23.33 || 20 ||  || 21 || 65.71 || 56 ||  || 57.14 || 0.87 ||  ||  ||  ||  ||  || There seems to been a foot on the Cr after the Cr etch, therefor it was repeated for 2 min Cr etch to remove the foot
|-
! test13/laqs
| 10 || 300 || 15 || 30 || 23.33 || 20 ||  || 28 || 100.71 ||  ||  || 42.86 || 0.43 ||  ||  ||  ||  ||  || This recipe was chosen over no. 12 because it did not need a large over etch of the Cr (no foot).
|-
! test14
| 10 || 300 || 15 || 40 || 25.00 || 20 ||  || 30 || 88.00 ||  ||  || 40.00 || 0.45 ||  ||  ||  ||  ||  || 
|-
! 
|  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  || 
|-
! nano (some other users recipe found on the ICP)
| 5 || 500 || 15 || 60 || 0.17 || 10 ||  || 33 || 99.00 ||  ||  || 36.36 || 0.37 ||  || 41 || 52 || 31 || 50 || With strike pressure
|-
! langman
| 10 || 500 || 25 || 40 || 0.20 || 8 ||  || 21 || 168.39 ||  ||  || 57.14 || 0.34 ||  || 42 || 52 || 35 || 53 || With strike pressure
|}

===SEM images of the tests after the DOE===
These SEM images where done after both the Cr etch and the silicon nitride etch in the ICP metal using the recipe "Slow etch with carrier". The important thing was to see how well the Cr work for masking the nitride given vertical and smooth sidewalls.   

<gallery caption="Sample test11" widths="250px" heights="250px" perrow="8">

Image:EBL10_CrTest11_159.jpg
Image:EBL10_CrTest11_160.jpg
Image:EBL10_CrTest11_161.jpg
Image:EBL10_CrTest11_162.jpg
Image:EBL10_CrTest11_163.jpg
Image:EBL10_CrTest11_164.jpg
Image:EBL10_CrTest11_166.jpg
Image:EBL10_CrTest11_167.jpg

</gallery>

<gallery caption="Sample test12 1 min etch in Cr" widths="250px" heights="250px" perrow="8">

Image:EBL10_CrTest12-1min_148.jpg
Image:EBL10_CrTest12-1min_150.jpg
Image:EBL10_CrTest12-1min_153.jpg
Image:EBL10_CrTest12-1min_155.jpg
Image:EBL10_CrTest12-1min_157.jpg
Image:EBL10_CrTest12-1min_158.jpg

</gallery>


<gallery caption="Sample test12 2 min etch in Cr" widths="250px" heights="250px" perrow="8">

Image:EBL10_CrTest12-2min_138.jpg
Image:EBL10_CrTest12-2min_139.jpg
Image:EBL10_CrTest12-2min_141.jpg
Image:EBL10_CrTest12-2min_142.jpg
Image:EBL10_CrTest12-2min_143.jpg
Image:EBL10_CrTest12-2min_144.jpg
Image:EBL10_CrTest12-2min_145.jpg
Image:EBL10_CrTest12-2min_146.jpg

</gallery>

<gallery caption="Sample test13" widths="250px" heights="250px" perrow="8">

Image:EBL10_CrTest13_127.jpg
Image:EBL10_CrTest13_129.jpg
Image:EBL10_CrTest13_130.jpg
Image:EBL10_CrTest13_132.jpg
Image:EBL10_CrTest13_133.jpg
Image:EBL10_CrTest13_134.jpg
Image:EBL10_CrTest13_135.jpg
Image:EBL10_CrTest13_136.jpg

</gallery>

<gallery caption="Sample testnano" widths="250px" heights="250px" perrow="8">

Image:EBL10_nano_101.jpg
Image:EBL10_nanol_103.jpg
Image:EBL10_nanol_104.jpg
Image:EBL10_nanol_106.jpg
Image:EBL10_nanol_107.jpg
Image:EBL10_nanol_110.jpg
Image:EBL10_nanol_112.jpg
Image:EBL10_nanol_113.jpg

</gallery>

<gallery caption="Sample elangman" widths="250px" heights="250px" perrow="8">

Image:EBL10_elang_115.jpg
Image:EBL10_elang_116.jpg
Image:EBL10_elang_118.jpg
Image:EBL10_elang_119.jpg
Image:EBL10_elang_121.jpg
Image:EBL10_elang_122.jpg
Image:EBL10_elang_123.jpg

</gallery>