View source for Specific Process Knowledge/Etch/DRIE-Pegasus/processA/PrA-2

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{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|-
! rowspan="2" width="40"| Date
! colspan="2" width="120"| Substrate Information
! colspan="3" | Process Information
! rowspan="2" |SEM Images
|-
! width="30" | Wafer info
! width="40" | Exposed area
! width="40" | Conditioning
! width="40" | Recipe
! width="40" | Wafer ID
|-
| 2/5-2016
| 4" Travka20 Wafer 
| 20 % Si
| 3 minute TDESC clean
| PrA-2, 80 cycles or 14:40 minutes 
| C03991.03
| 
[[file:C03991.03 103.jpg|150px|frameless ]]
[[file:C03991.03 104.jpg|150px|frameless ]]
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[[file:C03991.03 118.jpg|150px|frameless ]]
[[file:C03991.03 119.jpg|150px|frameless ]]
|-
| 2/5-2016
| 4" Travka20 Wafer 
| 20 % Si
| 3 minute TDESC clean
| PrA-2, 80 cycles or 14:40 minutes 
| C03991.06
| 
[[file:C03991.06 152.jpg|150px|frameless ]]
[[file:C03991.06 153.jpg|150px|frameless ]]
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[[file:C03991.06 169.jpg|150px|frameless ]]
|-
| 3/6-2016
| 4" Travka20 Wafer 
| 20 % Si
| 3 minute TDESC clean
| PrA-2, 80 cycles or 14:40 minutes 
| C04047.03
| 
[[file:C04047.03 109.jpg|150px|frameless ]]
[[file:C04047.03 108.jpg|150px|frameless ]]
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[[file:C04047.03 097.jpg|150px|frameless ]]

|-
| 3/6-2016
| 4" Travka20 Wafer 
| 20 % Si
| 3 minute TDESC clean
| PrA-2, 80 cycles or 14:40 minutes 
| C04047.06
| 
[[file:C04047.06 153.jpg|150px|frameless ]]
[[file:C04047.06 152.jpg|150px|frameless ]]
[[file:C04047.06 151.jpg|150px|frameless ]]
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|-
|}