View source for Specific Process Knowledge/Etch/DRIE/Pegasus/DREM/DREM 3kW 100%

<!-- Page reviewed 9/8-2022 jmli -->


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! rowspan="2" width="40"| Date
! colspan="2" width="120"| Substrate Information
! colspan="4" | Process Information
! colspan="3" width="200" | Results
|-
! width="30" | Wafer info
! width="40" | Material/ Exposed area
! width="40" | Condi- tioning
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Comments
! width="400" |SEM images
! width="400" |Picoscope 
! width="400" |Numbers 
|-
|27/11-2019
|Medusa One AZ Mir
|Si /  10%
|stab-19 TDESC clean5, RF MU runs 
|nanolab/ vy / DREM / DREM 3kW 100% 120 cycles or 10:0 minutes	
|S018605
|[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=339961 Process log entry]
| 
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{| {{table}} 
| align="center" style="background:#f0f0f0;"|'''SEM image:'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a580.png a580]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a582.png a582]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a583.png a583]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a584.png a584]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a586.png a586]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a587.png a587]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a588.png a588]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a589.png a589]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a591.png a591]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a592.png a592]'''
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018605a593.png a593]'''
|- 
| Trench width (um)||250.32||160.36||80.48||40.42||25.42||16.66||10.43||8.38||5.02||2.95||3
|- 
| Etched depth (um)||144.98||143.11||138.38||126.78||116.06||105.34||93.04||87.39||76.48||65.37||62.15
|- 
| Etch rate (um/min)||14.5||14.31||13.84||12.68||11.61||10.53||9.3||8.74||7.65||6.54||6.22
|- 
| <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>||1.21||1.19||1.15||1.06||0.97||0.88||0.78||0.73||0.64||0.54||0.52
|- 
| Sidewall bowing (%)||-0.53||-0.63||-0.12||-0.08||0.14||0.33||0.54||0.65||0.71||0.43||0.59
|- 
| Sidewall angle (degs)||92.18||92.25||91.6||91.51||91.32||91.19||91.02||90.92||90.88||90.99||90.48
|- 
| Bottom bowing (%)||6.79||9.32||14.81||17.52||16.14||18.1||17.8||21.85||21.87||31.29||26.32
|- 
|Aspect ratio||0.57||0.86||1.64||2.9||4.13||5.59||7.7||8.93||12.35||16.03||17.63
|- 
|}
|- 
|}