View source for LabAdviser/Courses/TPT Ebeam

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This online course is currently under prepration. It will include theory on electron beam lithography and equipment, as well as training in preparation of exposure files and equipment operation. The course will be a prerequisite for hands-on training on the electron beam tool. 

There are currently a set of tutorials that we request new users to study prior to hands-on training.

== Training for JEOL 9500 ==
The training on the Jeol tool consists of 3 sessions.

# '''Files training:''' We normally show you how to prepare the files for an exposure. There are three different files that need to be prepared prior the exposure: sdf, jdf and v30. You should read and understand the information about files preparation (info below) and have your pattern ready before this training. 
# '''First exposure:''' We show you how to operate the tool. Please read the information about [[Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL|My first JEOL 9500 exposure]] prior to this training and watch the our [https://www.youtube.com/watch?v=-wZpUNAq8dA JEOL Training Tutorial].
# '''Second exposure:''' Throughout this training, you will independently operate the tool, and we will assess your ability to do so without assistance.
# '''(Optional) Alignment training:''' If you at some point need to perform alignment, we recommend to plan an extra training. We do not advise alignment during the first training as it can become quite complicated. If you do need alignment during the first exposure, please let us know. 


To get ready for the first training you will need to read the information in LabAdviser for the files’ preparation:


'''Creating the *.v30 file'''

To prepare the *.v30 file from your design, you will need to use a special software called "[[Specific Process Knowledge/Lithography/EBeamLithography/BEAMER|'''Beamer''']]". You can access the software at the computers in the  EBL room inside the cleanroom or in the "copy room" (building 346, '''room XX'''). You can read more about how to use "Beamer" and how to create the design file under [[Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation|'''JEOL Job Preparation''']]. To find more information about advanced features under [[Specific Process Knowledge/Lithography/EBeamLithography/BEAMER|'''Beamer''']]. If you cannot manage to create the *.v30 files on your own, we will cover this during the "files training". 

'''Creating the sdf and jdf files'''

To prepare the jdf and sdf files, we normally recommend using SuperEdi. It is a freeware and you can download [https://www.wolosoft.com/en/superedi/ '''here''']. You can find detailed explanation of how to create the *.jdf and *.sdf files under [[Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation|'''JEOL Job Preparation''']]. You will also find some examples of the files and explanation of the different commands. To make the most of the training, we recommend you to try preparing your *.jdf and *.sdf files before the files training. We will go through the files and discuss any possible mistakes during the training.

There is more information on our electron beam lithography equipment available on Labadviser. Please feel free to browse through the information and do not hesitate to contact us at [Mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk] if you have any questions.

== Training for Raith e-LINE ==
The training on the Raith e-LINE consists of two sessions at the tool.

* '''First training''': we show you how to run the first exposure or auto imaging, please read the manual on labmanager and if need auto imaging watch the video [https://youtu.be/YoZF_6FeVb4?si=9Jr2Be6I1kdztJtT here]
* '''Second training:''' the user demonstrates the ability to operate the tool independently. 
* '''File preparation:''' the system accepts gds, and cif files, incase a proximity error correction is needed one can use [[Specific Process Knowledge/Lithography/EBeamLithography/BEAMER|'''Beamer''']] software (please check manual on how to export the file).   

Due to the tool’s various functionalities, the content covered during training may vary depending on the user's intended use.

Before attending the training, users must fulfill the following prerequisites:

* Users who intend to use '''only''' the imaging mode must have passed the SEM TPT.
* Users who plan to use e-beam lithography, or both e-beam lithography and SEM mode, must have passed both the SEM TPT and the Lithography TPT.