Jump to content

View source for File:BGE Glass etch Lesker test2 pinholes 3.jpg

← File:BGE Glass etch Lesker test2 pinholes 3.jpg

You do not have permission to edit this page, for the following reason:

The action you have requested is limited to users in the group: NLAB-Employees-701.

You can view and copy the source of this page.

Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.

Return to File:BGE Glass etch Lesker test2 pinholes 3.jpg.

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=File:BGE_Glass_etch_Lesker_test2_pinholes_3.jpg"