View source for Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano121

== The nano1.21 recipe ==

{| border="2" cellpadding="2" cellspacing="1" 
|+ '''Recipe nano1.21'''
|-
! rowspan="6" align="center"| Recipe
| Gas
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 52 sccm
|-
| Pressure
| 4 mTorr, Strike 3 secs @ 15 mTorr
|-
| Power
| 800 W CP, 50 W PP
|- 
| Temperature
| -10 degs
|-
| Hardware
| 100 mm Spacers
|-
| Time
| 120 secs
|-
! rowspan="3" align="center"| Conditions
| Run ID
| 1925
|-
| Conditioning
| Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
|-
| Mask
|  nm zep etched down to 6dgh4 nm
|- 
|}


<gallery caption="The results of the nano1.2 recipe" widths="250" heights="200" perrow="3">
image:WF_2E06_mar23B-030.jpg|The 30 nm trenches
image:WF_2E06_mar23B-060.jpg|The 60 nm trenches
image:WF_2E06_mar23B-090.jpg|The 90 nm trenches
image:WF_2E06_mar23B-120.jpg|The 120 nm trenches
image:WF_2E06_mar23B-150.jpg|The 150 nm trenches
C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs
</gallery>