View source for Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 3kW 100% b

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! rowspan="2" width="40"| Date
! colspan="2" width="120"| Substrate Information
! colspan="4" | Process Information
! colspan="3" width="200" | Results
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! width="30" | Wafer info
! width="40" | Material/ Exposed area
! width="40" | Condi- tioning
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Comments
! width="400" |SEM images
! width="400" |Picoscope 
! width="400" |Numbers 
|-
|29/11-2019
|Medusa One
|Si /  10%
|stab-19 chamber clean 20
|nanolab/ jmli /DREM 3.0 kW 100% b
|S018653
|[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=340452 Process log entry]
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{| {{table}} 
| align="center" style="background:#f0f0f0;"|'''SEM image:'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a000.png a000]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a001.png a001]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a002.png a002]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a003.png a003]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a004.png a004]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a005.png a005]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a006.png a006]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a007.png a007]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a008.png a008]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a009.png a009]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a010.png a010]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a011.png a011]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a012.png a012]'''
| align="center" style="background:#f0f0f0;"|'''[http://labadviser.nanolab.dtu.dk/index.php/File:S018653a013.png a013]'''
|- 
| Trench width (um)||159.77||401.82||251.88||250.36||158.96||99.72||61.82||40.77||32.13||25.67||12.84||7.24||4.13||2.6
|- 
| Etched depth (um)||145.56||145.42||145.8||147.62||146.52||142.74||136.64||128.65||123.88||118.18||100.34||84.65||69.04||60.36
|- 
| Etch rate (um/min)||14.56||14.54||14.58||14.76||14.65||14.27||13.66||12.86||12.39||11.82||10.03||8.46||6.9||6.04
|- 
| <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>||1.21||1.21||1.21||1.23||1.22||1.19||1.14||1.07||1.03||0.98||0.84||0.71||0.58||0.5
|- 
| Sidewall bowing (%)||-0.28||-0.51||-0.38||-0.38||-0.4||0.05||0.18||-0.14||0.09||0.19||0.36||0.45||0.52||0.53
|- 
| Sidewall angle (degs)||92.65||93.1||92.66||93.02||92.84||92.17||92.04||91.86||91.92||91.7||91.52||91.05||90.71||90.61
|- 
| Bottom bowing (%)||8.1||3.9||6.18||6.71||9.14||10.53||14.26||17.43||16||16.76||15.69||16.18||14.53||11.69
|- 
|Aspect ratio||0.87||0.35||0.56||0.57||0.88||1.36||2.05||2.86||3.41||4.05||6.47||9.64||13.86||18.56
|- 
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