View source for Specific Process Knowledge/Thin film deposition/Deposition of Titanium/Ti deposition in Sputter System (Lesker)

=Ti Sputtering=

This page presents the results of Ti deposition using <b>DC sputtering</b> in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is <b>Ti</b>. Source #3 (DC) was used.

The fabrication and characterization described below were conducted in <b>2021 by Evgeniy Shkondin, DTU Nanolab</b>. The prepared samples were investigated by the X-ray Reflectivity method. The focus of the study was the deposition conditions. 


The process recipe in a Sputter-System (Lesker) is following:


* Deposition type: <b>DC</b>
* Power: <b>Variable</b>.
* Pressure: <b>3 mTorr</b>
* Gas: <b>Ar</b>
* Deposition time: <b>Variable</b>.
* Temperature: 20&deg;C (no heating)


<gallery caption="Deposition rate as a function of power." widths="500px" heights="400px" perrow="1">
image:eves_dep_rate_vs_power_Ti_DC_3mTorr_old_Lesker_2021.png| Deposition rate as a function of power is represented only by two measurements (20W and 250W). Nevertheless, since the fit value goes directly through the origin of the plot it looks very trustworthy. 
</gallery>



===Power 20W===

Such a low power can be used for doping purposes during transparent conducting oxide thin film production (such as doped ZnO or similar). For other applications higher powers are preferable.

* Measured DC bias: 253V
* Deposition time: 1800s
* Deposition Rate: <b><span style="color: red">0.007 nm/s</span></b>
<br>
<!-- -->

{| border="2" cellspacing="2" cellpadding="5"  align="center"

|- 
!colspan="6" border="none" style="background:silver; color:black;" align="center"| Layer parameter list
|-
|style="background:WhiteSmoke; color:black"|<b>Layer name</b>
|style="background:WhiteSmoke; color:black"|<b>Thickness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Density (g/cm<sup>3</sup>)</b>
|style="background:WhiteSmoke; color:black"|<b>Rougness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Delta</b>
|style="background:WhiteSmoke; color:black"|<b>Beta</b>

|-
|<b>Moisture</b>
|1.29
|1.00
|1.75
|style="background:WhiteSmoke; color:black"|3.2782e-6
|style="background:WhiteSmoke; color:black"|7.6125e-8

|-
|<b>Ti (sputtered)</b>
|<p style="color:red;"><b>12.63</b></p>
|4.41
|0.94
|style="background:WhiteSmoke; color:black"|1.2532e-5
|style="background:WhiteSmoke; color:black"|1.0221e-6

|-
|<b>SiO<sub>2</sub> (native oxide)</b>
|2.00
|2.14
|0.32
|style="background:WhiteSmoke; color:black"|6.9461e-6
|style="background:WhiteSmoke; color:black"|9.0523e-8

|-
|<b>Si (wafer)</b>
|<math>\infty</math>
|2.328
|0.53
|style="background:WhiteSmoke; color:black"|7.5796e-6
|style="background:WhiteSmoke; color:black"|1.7601e-7

|}

<gallery caption="XRR analysis of Ti thin film." widths="1500px" heights="500px" perrow="1">
image:eves_Ti_old_lesker_20W_2021.png| X-ray reflectivity. Measurement and Fit.
</gallery>

===Power 250W===

High powers can be used for metalic contacts, adhesion layers, etc.

* Measured DC bias: 330V
* Deposition time: 60s
* Deposition Rate: <b><span style="color: red">0.094 nm/s</span></b>
<br>
<!-- -->

{| border="2" cellspacing="2" cellpadding="5"  align="center"

|- 
!colspan="6" border="none" style="background:silver; color:black;" align="center"| Layer parameter list
|-
|style="background:WhiteSmoke; color:black"|<b>Layer name</b>
|style="background:WhiteSmoke; color:black"|<b>Thickness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Density (g/cm<sup>3</sup>)</b>
|style="background:WhiteSmoke; color:black"|<b>Rougness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Delta</b>
|style="background:WhiteSmoke; color:black"|<b>Beta</b>

|-
|<b>Moisture</b>
|0.32
|1.46
|0.04
|style="background:WhiteSmoke; color:black"|4.4860e-6
|style="background:WhiteSmoke; color:black"|2.1962e-7

|-
|<b>Ti (sputtered)</b>
|<p style="color:red;"><b>5.66</b></p>
|4.95
|1.85
|style="background:WhiteSmoke; color:black"|1.4735e-5
|style="background:WhiteSmoke; color:black"|1.2017e-6

|-
|<b>SiO<sub>2</sub> (native oxide)</b>
|1.48
|1.74
|0.37
|style="background:WhiteSmoke; color:black"|5.6276e-6
|style="background:WhiteSmoke; color:black"|7.3340e-8

|-
|<b>Si (wafer)</b>
|<math>\infty</math>
|2.328
|0.29
|style="background:WhiteSmoke; color:black"|7.5796e-6
|style="background:WhiteSmoke; color:black"|1.7601e-7

|}

<gallery caption="XRR analysis of Ti thin film." widths="1500px" heights="500px" perrow="1">
image:eves_Ti_old_lesker_250W_2021.png| X-ray reflectivity. Measurement and Fit.
</gallery>