View source for Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic

= Isotropic etching in silicon on the ICP Metal Etch =



{| border="1" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process parameters'''
|-
! rowspan="2" width="100"| Recipe
! rowspan="2" width="20"| Step
! rowspan="2" width="20"| Temp.
! rowspan="2" width="20"| Time
! rowspan="2" width="20"| Pres.
! rowspan="2" width="20"| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware | Hardware]]  
! colspan="10" | Gasses
! colspan="2" | RF powers
! colspan="2" | Observations
|-
! width="40" | SF<sub>6</sub>
! width="40" | O<sub>2</sub>
! width="40" | C<sub>4</sub>F<sub>8</sub>
! width="40" | Ar
! width="40" | CF<sub>4</sub>
! width="40" | H<sub>2</sub>
! width="40" | CH<sub>4</sub>
! width="40" | BCl<sub>3</sub>
! width="40" | Cl<sub>2</sub>
! width="40" | HBr
! width="40" | Coil 
! width="40" | Platen
! width="40" | Runs
! width="40" | Keywords
|-
! isoslow1      <!--Recipe Name  -->
| A           <!--Step  -->
| 20            <!--Temperature  -->
| -            <!--Process time (needed if ramping is enabled)  -->
| 90 ?           <!--Pressure  -->
|       <!--Process chamber setup  -->
| 50 ?            <!--SF6 flow  -->
| 0            <!--O2 flow  -->
| 0            <!--C4F8 flow  -->
| 0            <!--Ar flow  -->
| 0            <!--CF4 flow  -->
| 0            <!--H2 flow  -->
| 0            <!--CH4 flow  -->
| 0            <!--BCl3 flow  -->
| 0            <!--Cl2 flow  -->
| 0            <!--HBr flow  -->
| 400            <!--Coil power  -->
| 3          <!--Platen power  -->
| [[Main Page/Process Logs/jmli/IcpMetal/Si/isotropic/isoslow1 | 1]]       <!-- link processes -->
| NA           <!--Keywords  -->
|-
| '''r'''  || A || 20 || - || 28 || LF+B100 || 30 || 37 || 0 || 0 || 0 || 0 || 0  || 0 || 0 || 0  || 0 || 100 
|| [[Main Page/Process Logs/jmli/IcpMetal/BS/rdabs2 | 1]]  || NA  
|-
|}