Main public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

13:36, 21 April 2026 Jenk talk contribs created page File:Citrix sign-out.png
13:36, 21 April 2026 Jenk talk contribs uploaded File:Citrix sign-out.png
13:33, 21 April 2026 Jenk talk contribs created page File:Citrix computer-login.png
13:33, 21 April 2026 Jenk talk contribs uploaded File:Citrix computer-login.png
13:32, 21 April 2026 Jenk talk contribs created page File:Citrix Apps.png
13:32, 21 April 2026 Jenk talk contribs uploaded File:Citrix Apps.png
13:28, 21 April 2026 Jenk talk contribs created page File:Citrix login.png
13:28, 21 April 2026 Jenk talk contribs uploaded File:Citrix login.png
14:36, 20 April 2026 User account S234458 talk contribs was created automatically
12:28, 14 April 2026 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/mrEBL6000 (content before blanking was: " <br> mrEBL6000 works as a negative e-beam resist but is also UV sensitive, why resist and coated wafers should be kept in yellow rooms only. When carrying the wafers to the e-beam writer, use a black or blue box for protection. While mounting the wafers in the e-beam cassettes, you can turn off the white light in the e-beam room and turn on the yellow light which is located above the pre-aligner setup. Please mount as close to exposure as possible and turn of...")
12:28, 14 April 2026 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithographyManual (content before blanking was: "= Purpose, location and technical specifications = The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns with dimensions from nanometers to sub-micrometers. Substrates that needs e-beam exposure should be mounted in a cassette and transferred into the writer via the robot loader (autoloader). To request for an e-beam training session, contact e-beam@nanolab.dtu.dk; a DTU Nanolab...")
23:45, 12 April 2026 User account Weixi talk contribs was created automatically
10:09, 9 April 2026 Pevo talk contribs created page File:SEM Supra 2.jpg (SEM Supra 2)
10:09, 9 April 2026 Pevo talk contribs uploaded File:SEM Supra 2.jpg (SEM Supra 2)
10:04, 9 April 2026 User account Daninie talk contribs was created automatically
12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/ma (content before blanking was: "Technical specification Sample requirements Any sample allowed in the cleanroom can be imaged in Gemini 1. If you have any questions, please consult the persons responsible for the SEM. Sample sizes: Up to 8" wafers (the ranges on the X and Y axes only provide full view of a 6" wafer) Vacuum modes: The SEM is usually operated in high vacuum (HV) mode where the chamber pressure is somewhere in the 2*10-4 to 10-6 mbar range. For imaging of non-conducting sa...")
12:49, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Potasi click here]'''   {{Template:Author-jmli1}}  ; Question : We have had several requests on etches that produce slop...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Nanoetch click here]'''   ''Unless otherwise stated, all content on this page was created by Berit Geilmann Herstrøm, DTU Nanolab'' <!--Checked for updates on 2/02-2023...")
12:48, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Matching (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Matching click here]'''   ; Question 1 :Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on time so I couldn't...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Bonding click here]'''   ; Question 1 : A user tried to etch through a wafer using a carrier and crystalbond as medium (see image below). Even though he ran the standard...")
12:47, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/FAQ/Masks click here]'''   ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about AL...")
12:41, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM Gemini 1/use (content was: " Detectors Se2 Inlens Inlens ESB BSD1 VPSE STEM High vacuum Low vacuum NanoVP XVP {| class="wikitable" |+ Caption text |-esb ! Detectors !! Se2 !! Inlens !! Inlens ESB !! BSD1 !! VPSE !! STEM !! Header text |- ! High vacuum || Yes || Yes ||Yes|| Yes || Example || Example || Example |- ! Low vacuum || Example || Example || Example || Example || Example ||...", and the only contributor was "Jmli" (talk))
12:37, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide (content before blanking was: "<!-- The Nikon Eclipse L200 series mikroscopes can autoscan a wafer to image the entire wafer. The mini guide below shows one way of setting this up. The guide is setup for a full wafer scan of a 6" wafer which takes app. 4-6 hours to scan and gives app. 5000 images of 3-4MB each (at 10x Objective), hence fills a lot of storage. It is recommended to '''store the data on the temporary folder''' in the C-drive and '''move the images (e.g., to the cleanroom drive)...")
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithPatternPreparation (content was: "= Pattern preparation for exposure on the Raith eLine Plus =", and the only contributor was "Thope" (talk))
12:36, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/authors generic (content before blanking was: "")
12:35, 7 April 2026 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 trouble shooting (content was: "Error messages on the JEOL 9500 system can sometimes be difficult to understand. Hence we have collected a series of the most typical errors users may encounter on the system. They are divided into compilation errors experienced at file compilation and execution errors experienced at job execution. =Compilation errors= To come =Execution errors= To come", and the only contributor was "Thope" (talk))
11:59, 7 April 2026 User account Chrsp talk contribs was created automatically
10:13, 7 April 2026 User account Nemwo talk contribs was created automatically
17:46, 2 April 2026 User account S255986 talk contribs was created automatically
12:44, 26 March 2026 Jbram talk contribs created page File:View topright Filters&Light Path.jpg
12:44, 26 March 2026 Jbram talk contribs uploaded File:View topright Filters&Light Path.jpg
12:42, 26 March 2026 Jbram talk contribs created page File:View front right .jpg
12:42, 26 March 2026 Jbram talk contribs uploaded File:View front right .jpg
12:36, 26 March 2026 Jbram talk contribs created page File:OlympusMX63.jpg
12:36, 26 March 2026 Jbram talk contribs uploaded File:OlympusMX63.jpg
16:20, 25 March 2026 User account Pbecu talk contribs was created automatically
13:59, 24 March 2026 User account S242583 talk contribs was created automatically
12:14, 23 March 2026 User account Geona talk contribs was created automatically
16:44, 16 March 2026 User account Qinra talk contribs was created automatically
16:16, 16 March 2026 Thes talk contribs created page File:Labs3.png (File uploaded with MsUpload)
16:16, 16 March 2026 Thes talk contribs uploaded File:Labs3.png (File uploaded with MsUpload)
16:03, 16 March 2026 Thes talk contribs created page File:Labs2.png (File uploaded with MsUpload)
16:03, 16 March 2026 Thes talk contribs uploaded File:Labs2.png (File uploaded with MsUpload)
15:54, 16 March 2026 Thes talk contribs created page File:Labs1.png (File uploaded with MsUpload)
15:54, 16 March 2026 Thes talk contribs uploaded File:Labs1.png (File uploaded with MsUpload)
15:43, 16 March 2026 Thes talk contribs created page LabAdviser/LabManager/Guide - select the proper laboratories (Created page with "== == To see equipment from a lab you must select it - click in the box in the header by Labs "Change". The labs you are authorized to enter will be selected, if you have not selected any labs. However, you can deselect some if there is too much information - and you can also select labs you are not authorized for.")
15:34, 16 March 2026 Thes talk contribs created page LabAdviser/LabManager/Front Page (Created page with "===Equipment Being Used=== This part shows equipment currently in use. Users own bookings are located at the top of the "Equipment Being Used"-list while equipment used by other users is listed in alphabetical order. You can directly access the process log as well as stop equipment usage - immediately ("Stop Now") or with a specified time delay ("Delayed Stop)". <br> ===My Bookings Today=== Equipment usage can be started in different ways. One possibility is via the Fr...")
11:14, 13 March 2026 User account Chmode talk contribs was created automatically
17:20, 9 March 2026 User account S246080 talk contribs was created automatically
16:33, 5 March 2026 User account Dinxi talk contribs was created automatically