File:SU-8 on SiO2 wafer soft lithography.jpg

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SU-8 negative micropattern on silicon wafer fabricated by soft lithography in the clean room for PDMS micromolding

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	18:32, 23 July 2026		3,060 × 4,080 (3.29 MB)	Cchvi (talk \| contribs)

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Camera manufacturer	samsung
Camera model	Galaxy A36 5G
Exposure time	4,153,767/500,000,000 sec (0.008307534)
F Number	f/1.8
ISO speed rating	200
Date and time of data generation	11:00, 12 May 2026
Lens focal length	4.69 mm
Width	4,080 px
Height	3,060 px
Orientation	Rotated 90° CCW
Horizontal resolution	72 dpi
Vertical resolution	72 dpi
Software used	A366BXXS8BZC2
File change date and time	11:00, 12 May 2026
Y and C positioning	Centered
Exposure Program	Normal program
Exif version	2.2
Date and time of digitizing	11:00, 12 May 2026
APEX shutter speed	0.008307534
APEX aperture	1.69
APEX brightness	2.6
APEX exposure bias	0
Maximum land aperture	1.69 APEX (f/1.8)
Metering mode	Spot
Flash	Flash did not fire
DateTime subseconds	668
DateTimeOriginal subseconds	668
DateTimeDigitized subseconds	668
Supported Flashpix version	1
Color space	sRGB
Exposure mode	Auto exposure
White balance	Auto white balance
Digital zoom ratio	1
Focal length in 35 mm film	25 mm
Scene capture type	Standard