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2.1
SEM: Scanning Electron Microscopy
2.2
AFM: Atomic Force Microscopy
2.3
Profiler
2.4
Optical microscope
2.5
Optical characterization
2.6
Photoluminescence Mapper
2.7
SIMS: Secondary Ion Mass Spectrometry
2.8
Drop Shape Analyzer
2.9
4-Point Probe
2.10
Thickness Measurer
2.11
Probe station
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Specific Process Knowledge/Characterization
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From LabAdviser
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Specific Process Knowledge
Revision as of 10:40, 4 July 2011 by
Jml
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Choose topic
Sample imaging
Topographic measurement
Stress measurement
Measurement of film thickness and optical constants
Wafer thickness measurement
Element analysis
Hydrophobicity measurement
Resistivity measurement
Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy
FEI SEM
LEO SEM
JEOL SEM
Zeiss SEM
AFM: Atomic Force Microscopy
Nanoman -
AFM
Profiler
Dektak 8 stylus profiler
Tencor stylus profiler
Optical microscope
Optical characterization
Ellipsometer
Filmtek 4000
Prism Coupler
Photoluminescence Mapper
SIMS: Secondary Ion Mass Spectrometry
Atomika SIMS
Drop Shape Analyzer
4-Point Probe
Thickness Measurer
Probe station
