Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic

Isotropic etching in silicon on the ICP Metal Etch

Process parameters

Recipe	Step	Temp.	Time	Pres.	Hardware	Gasses										RF powers		Observations
						SF6	O2	C4F8	Ar	CF4	H2	CH4	BCl3	Cl2	HBr	Coil	Platen	Runs	Keywords
isoslow1	A	20	-	90	-	50	0	0	0	0	0	0	0	0	0	400	3	1	NA