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Showing below up to 50 results in range #101 to #150.

101. Specific Process Knowledge/Thin film deposition/Deposition of Alumina (11:07, 16 December 2024)
102. Specific Process Knowledge/Thin film deposition/Deposition of ITO/Sputtering of ITO in Sputter-System Metal-Oxide (PC1) (19:08, 19 December 2024)
103. Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation (13:19, 2 January 2025)
104. Specific Process Knowledge/Lithography/Coaters/Spin Track 1 + 2 processing (14:45, 7 January 2025)
105. Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma E-beam and UV processing (15:01, 7 January 2025)
106. LabAdviser/314/Microscopy 314-307/TEM/Tips/MagicSwitch (08:59, 8 January 2025)
107. Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing (09:29, 9 January 2025)
108. Specific Process Knowledge/Thin film deposition/ALD Picosun R200/TiO2 deposition using ALD (10:23, 9 January 2025)
109. Specific Process Knowledge/Thin film deposition/Deposition of Carbon/Deposition of C in Sputter-System Lesker (12:24, 9 January 2025)
110. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool (12:26, 9 January 2025)
111. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Reactively sputtered SiO2 in Sputter-System Metal Oxide (PC1) (12:43, 9 January 2025)
112. Specific Process Knowledge/Thin film deposition/Deposition of Carbon (15:09, 9 January 2025)
113. Specific Process Knowledge/Lithography/Strip/PlasmaAsher1 (16:11, 9 January 2025)
114. Specific Process Knowledge/Lithography/Strip/PlasmaAsher2 (16:12, 9 January 2025)
115. Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/Al2O3 deposition using ALD2 (17:16, 9 January 2025)
116. Specific Process Knowledge/Thin film deposition/Deposition of Platinum/Deposition of Pt in Sputter System (Lesker) (17:18, 9 January 2025)
117. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Al sputtering in Sputter System (Lesker) (17:19, 9 January 2025)
118. Specific Process Knowledge/Thin film deposition/Deposition of Titanium/Ti deposition in Sputter System (Lesker) (17:20, 9 January 2025)
119. Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/Standard recipes on the ALD2 tool (17:28, 9 January 2025)
120. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS (14:58, 10 January 2025)
121. Specific Process Knowledge/Lithography/Coaters/GammaUV (16:34, 13 January 2025)
122. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD (10:15, 21 January 2025)
123. Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using AOE/With Hard Mask (09:33, 28 January 2025)
124. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Al Sputtering in Cluster Lesker PC3 (08:52, 30 January 2025)
125. Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617 (00:00, 8 February 2025)
126. Specific Process Knowledge/Doping (14:47, 12 February 2025)
127. Specific Process Knowledge/Wafer and sample drying (14:48, 12 February 2025)
128. Specific Process Knowledge/Bonding (17:05, 13 February 2025)
129. Surveys and statistics (18:21, 13 February 2025)
130. Specific Process Knowledge/Pattern Design/Travka (18:24, 13 February 2025)
131. Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium (11:39, 18 February 2025)
132. Specific Process Knowledge/Thin film deposition/ALD Picosun R200/HfO2 deposition using ALD new page (11:00, 19 February 2025)
133. LabAdviser/Courses/TPT Thin Film (19:54, 24 February 2025)
134. LabAdviser/Courses/TPT Dry Etch (23:03, 24 February 2025)
135. Deposition of SiN with PECVD4/NEW TESTS QC (14:14, 4 March 2025)
136. Specific Process Knowledge/Thermal Process/Storage and cleaning of wafer to the A, B, C and E stack furnaces (13:22, 6 March 2025)
137. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of silicon nitride using Lesker sputter system (14:00, 6 March 2025)
138. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of silicon nitride using Sputter-System Metal-Oxide(PC1) (14:01, 6 March 2025)
139. Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si (14:24, 6 March 2025)
140. Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of low stress nitride using the 4" LPCVD nitride furnace (15:12, 6 March 2025)
141. Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of stoichiometric nitride using the 6" LPCVD nitride furnace (15:14, 6 March 2025)
142. Specific Process Knowledge/Thermal Process/Resist Pyrolysis furnace/Pyrolysis with Resist Pyrlysis furnace (15:14, 6 March 2025)
143. Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs (07:51, 10 March 2025)
144. Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point (08:06, 10 March 2025)
145. Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/SiO2 etch with resist mask (08:20, 10 March 2025)
146. LabAdviser/Technology Research/Nanofabrication of Inductive Components for Integrated Power Supply On Chip/3D Passive Interposer (08:36, 10 March 2025)
147. LabAdviser/314/Microscopy 314-307 (09:02, 10 March 2025)
148. Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New (11:49, 10 March 2025)
149. Specific Process Knowledge/Thin film deposition/TiO2 deposition using Sputter-System Metal-Oxide(PC1) (10:55, 12 March 2025)
150. Specific Process Knowledge/Lithography/Pretreatment/Oven 250C (14:45, 17 March 2025)