Specific Process Knowledge/Lithography/Strip/plasmaAsher03

Plasma Asher 3: Descum

Plasma Asher 3: Descum is a low power plasma asher dedicated for descumming on smaller substrates.

Product name: Diener Pico Plasma Asher
Year of purchase: 2014

The Plasma Asher 3: Descum is dedicated for resist descum, i.e. removal of remains resist traces after development. It has a small chamber, so you can only load a single 100 mm substrate, or a few smaller pieces.

In this machine, only Oxygen is used for processing.

Typical process parameters:
Process: Photoresist descumming
Pressure: 0.2-0.8 mbar
Gas: 45 sccm O₂
Power: 100 W (100%)
Time: 1 -10 minutes (depending on photoresist type and thickness)

Other materials have not been tested.

The user manual, user APV, and contact information can be found in LabManager - requires login

Process Information

Detailed information about descum processing on Plasma asher 3: Descum can be found here.