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• 10:14, 12 January 2026 Jehem talk contribs created page Specific Process Knowledge/Lithography/UVExposure/aligner MA6-2 (Created page with "==Aligner: MA6-2== 400px|thumb|The Aligner: MA6-2 is located in E-4. The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography. The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, low vacuum, hard, soft, proximity) are supplied. Two alignment options are available: top side alignment (TSA) with a split field or a video microsc...")