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- 18:45, 13 October 2026 Eves talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Silicide/V3Si RF-DC Co-Sputtering in Cluster Lesker PC1 (Created page with "<i>This page was written by <b>Evgeniy Shkondin, DTU Nanolab</b>, unless otherwise stated.<br> All images and photographs on this page belong to <b>DTU Nanolab</b>.<br> The fabrication and characterization described below were conducted in <b>2026 by Evgeniy Shkondin, DTU Nanolab</b>.<br></i> =Vanadium Silicide RF-DC Co-Sputtering= This document presents the results of vanadium silicide (<b>V<sub>3</sub>Si</b>) deposition by RF-DC co-sputtering in the <i>Sputter-System...")