Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride== | ==Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride== | ||
===Recipes=== | |||
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|Recipe name | |||
|SiH4 flow [sccm] | |||
|NH3 flow [sccm] | |||
|N2 flow [sccm] | |||
|Pressure [mTorr] | |||
|Power [W] | |||
|Description | |||
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|1nitride | |||
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==Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride== | ==Recipes on PECVD3 for deposition of silicon nitride and silicon oxynitride== | ||