Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/SiO2 disk and granule source tests in Temescal October 2026: Difference between revisions
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The report follows the experimental sequence using source photographs, schematics, visual observations, and instrument recordings. The power curves retain the recorded values without smoothing. Run 1 heating-timer pauses are excluded from the main comparison and are separate from source instability. These exploratory tests document source behavior and provide a basis for further process development. | The report follows the experimental sequence using source photographs, schematics, visual observations, and instrument recordings. The power curves retain the recorded values without smoothing. Run 1 heating-timer pauses (caused by a recipe condition that issues an alarm message after 30 min of continuous heat; the value is corrected to 300 min for Run2) are excluded from the main comparison and are separate from source instability. These exploratory tests document source behavior and provide a basis for further process development. | ||
== Test design and recorded settings == | == Test design and recorded settings == | ||