Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Mfarin (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
781 edits
No edit summary
Mfarin (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
781 edits
No edit summary
Line 54: Line 54:
|}
|}


<nowiki>*</nowiki>Due to recent oscillations on the QC nitride recipe (HF), new tests were performed. Learn more about it under [[Deposition of SiN with PECVD4/NEW TESTS QC|NEW TESTS QC]] . (Still under construction)


<nowiki>*</nowiki>Due to recent oscillations on the QC nitride recipe (HF), new tests were performed. Learn more about it under NEW TESTS QC .


{| border="1" cellspacing="2" cellpadding="2"  
{| border="1" cellspacing="2" cellpadding="2"  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD"