Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions
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|650 | |650 | ||
|20HF 6s | |20HF 6s | ||
20LF 2s | |||
|Low stress nitride - standard recipe | |Low stress nitride - standard recipe | ||
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