Specific Process Knowledge/Thin film deposition/Deposition of Tungsten/Sputtering of W in Sputter Coater 3: Difference between revisions
Created page with "Sputter Coater 3 is mainly used for sample preparation before SEM inspection. Usually, Au is sputtered on dielectric surfaces to compensate for charge build-up. Alternatively, many other materials can be sputtered if the setup allows (you need to have a turbo pump and Ar gas). Gold can be deposited even in pure oxygen plasma and only with roughing pumps. Fortunately, Sputter Coater 3 located in the basement of building 346, has both a turbo pump and an Ar working gas sou..." |
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<gallery caption="Deposition of W on low aspect ratio Si trench structures." widths=" | <gallery caption="Deposition of W on low aspect ratio Si trench structures." widths="450px" heights="500px" perrow="3"> | ||
image:eves_W_sputter_coater_3_big_glass_trench_01_20220915.png| SEM image. 80mA 300s+300s deposition time. | image:eves_W_sputter_coater_3_big_glass_trench_01_20220915.png| SEM image. 80mA 300s+300s deposition time. | ||
image:eves_W_sputter_coater_3_big_glass_trench_02_20220915.png| SEM image. 80mA 300s+300s deposition time. | image:eves_W_sputter_coater_3_big_glass_trench_02_20220915.png| SEM image. 80mA 300s+300s deposition time. | ||