Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions
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==SiO<sub>2</sub> | ==SiO<sub>2</sub> Reactive RF Sputtering from Si target== | ||
This page presents the results of reactive SiO<sub>2</sub> deposition using <b>RF sputtering</b> with oxygen in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is <b>Si</b>. Source #5 (RF) was used. R-RF SiO<sub>2</sub> is commonly used for the dielectric layers, especially if lift-off is needed. | This page presents the results of reactive SiO<sub>2</sub> deposition using <b>RF sputtering</b> with oxygen in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is <b>Si</b>. Source #5 (RF) was used. R-RF SiO<sub>2</sub> is commonly used for the dielectric layers, especially if lift-off is needed. | ||
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* <b><span style="color: green">2</span></b>. Do not increase oxygen levels above 10% for the same reason as above. | * <b><span style="color: green">2</span></b>. Do not increase oxygen levels above 10% for the same reason as above. | ||
==Non reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ==Non reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ||