Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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Thin Film group thinfilm@nanolab.dtu.dk is responsible of the equipment | Thin Film group <i><u>thinfilm@nanolab.dtu.dk</u></i> is responsible of the equipment | ||
Target/Metal requests should be sent to metal@nanolab.dtu.dk | Target/Metal requests should be sent to <i><u>metal@nanolab.dtu.dk</i></u> | ||
If you need a training on the machine please send your request to: training@nanolab.dtu.dk. | If you need a training on the machine please send your request to: <i><u>training@nanolab.dtu.dk</i></u>. | ||