Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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* If PC3 is used, select “Master Heater PC3 - On” | * If PC3 is used, select “Master Heater PC3 - On” | ||
==Substrate | ==Substrate cleaning (RF Bias)== | ||
The RF cleaning can be used to clean the sample before the deposition. There are depicated recipes for that: | The RF cleaning can be used to clean the sample before the deposition. There are depicated recipes for that: | ||