Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
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[[Category: Equipment|Thin film Sputter deposition Lesker]] | [[Category: Equipment|Thin film Sputter deposition Lesker]] | ||
[[Category: Thin Film Deposition|Sputter deposition Lesker]] | [[Category: Thin Film Deposition|Sputter deposition Lesker]] | ||
Cluster-based multi-chamber high vacuum sputtering deposition system is a robotic cluster tool with two deosition chambers sharing the same distribution trasfer chamber and the load-lock. | |||
[[image:Kaempe_Lesker_image_front_page1.jpg|450x450px|right|thumb|Cluster-based multi-chamber high vacuum sputtering deposition system. View from service room Ax-1.]] | [[image:Kaempe_Lesker_image_front_page1.jpg|450x450px|right|thumb|Cluster-based multi-chamber high vacuum sputtering deposition system. View from service room Ax-1.]] | ||
Manufacture: Kurt J. Lesker company | |||
Model: 2017 PRO Line PVD75 thin film deposition cluster system | |||