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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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[[Category: Equipment|Thin film Sputter deposition Lesker]]
[[Category: Equipment|Thin film Sputter deposition Lesker]]
[[Category: Thin Film Deposition|Sputter deposition Lesker]]
[[Category: Thin Film Deposition|Sputter deposition Lesker]]
Cluster-based multi-chamber high vacuum sputtering deposition system is a robotic cluster tool with two deosition chambers sharing the same distribution trasfer chamber and the load-lock.


[[image:Kaempe_Lesker_image_front_page1.jpg|450x450px|right|thumb|Cluster-based multi-chamber high vacuum sputtering deposition system. View from service room Ax-1.]]
[[image:Kaempe_Lesker_image_front_page1.jpg|450x450px|right|thumb|Cluster-based multi-chamber high vacuum sputtering deposition system. View from service room Ax-1.]]
Manufacture: Kurt J. Lesker company
Model: 2017 PRO Line PVD75 thin film deposition cluster system