Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
Line 9: Line 9:
|-
|-
|
|
*[http://labmanager.dtu.dk/d4Show.php?id=1402&mach=395 The QC procedure for PECVD4]<br>
*[http://labmanager.dtu.dk/d4Show.php?id=5093&mach=395 The QC procedure for PECVD4]<br>
*[http://www.labmanager.dtu.dk/view_binary.php?type=data&mach=106 The newest QC data for PECVD3]<br>
*[http://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for PECVD4]<br>
{| {{table}}
{| {{table}}
| align="center" |  
| align="center" |  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD"