Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions
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!TEOS gas flow [sccm] | !TEOS gas flow [sccm] | ||
!O<math>_2</math> gas flow [sccm] | !O<math>_2</math> gas flow [sccm] | ||
!PH<math>_3</math> gas flow [sccm] | |||
!TMB | |||
!Comments | !Comments | ||
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